Shanghai Sunland Industrial Co., Ltd is the top manufacturer of Personal Protect Equipment in China, with 20 years’experience. We are the Chinese government appointed manufacturer for government power,personal protection equipment , medical instruments,construction industry, etc. All the products get the CE, ANSI and related Industry Certificates. All our safety helmets use the top-quality raw material without any recycling material.
pocket mask patterns
We provide exclusive customization of the products logo, using advanced printing technology and technology, not suitable for fading, solid and firm, scratch-proof and anti-smashing, and suitable for various scenes such as construction, mining, warehouse, inspection, etc. Our goal is to satisfy your needs. Demand, do your best.
Professional team work and production line which can make nice quality in short time.
The professional team provides 24 * 7 after-sales service for you, which can help you solve any problems
Address：No. 3888, Hutai Road, Baoshan District, Shanghai, China
CE Approved ,FFP2, grade (N95/KN95 equivalent) ,Face Masks, that meet Coronavirus conformity guidance from the World Health Organisation (WHO); Adjustable straps for a comfortable fit to help minimise distraction while working. A Lightweight and easy to use ,mask, that doesn’t put pressure on your ,face, …
MEMS ,fabrication, is an extremely exciting endeavor due to the customized nature of process technologies and the diversity of processing capabilities. MEMS ,fabrication, uses many of the same techniques that are used in the integrated circuit domain such as oxidation, diffusion, ion implantation, LPCVD, sputtering, etc., and combines these capabilities with highly specialized micromachining ...
Fabrication, of a new plastic photomask for the exposure process simplifies the shadow ,mask fabrication, process and results in higher resolution in the shadow ,mask, structures compared to the commercial ... and ,Cr, (30 nm). Scale bar in the shadow ,mask, image is 10 mm. Scale bars in multiple patterns images and close‐up images are 500 ...
The ,mask, order form contains the essential information needed to build a photomask that is not contained in the ,mask, design file. For each ,mask,, at a minimum we need to be told the ,mask, name, the gds layer number, the tone (polarity) and mirroring (parity) specifications, the size, feature type, location, and tone of the critical dimension (CD).
- Second ,mask fabrication, Dose map correction to the ,mask, writer-Grayscale ,mask, correction Pixer’s CDC. TM – tool by Carl Zeiss ... ,Cr, O Defect 4 1 nm Removed 10kV 10nA (expanded) ,Cr, EDX (current system) Auger. No defect information (Si, O, Ir are background) Defect identified as ,Cr